Photonics Spectra Micromachining Summit and SPIE Photomask Technology + EUVL

September is a busy month for us! We will be presenting at the Photonics Spectra Micromachining Summit, as well as exhibiting at SPIE Photomask Technology + Extreme Ultraviolet Lithography in Monterey, CA.

Photonics Spectra Micromachining Summit 2025

On September 17th, Photonics Spectra is hosting its Micromachining Summit, a one-day virtual event showcasing ultraprecise, reliable, and scalable micromachining solutions across industries and application areas, including medical devices, electronics, and semiconductors.

Our own Logan Hatanaka, Ph.D., will be presenting a session, titled Sharpening Precision: Laser Beam Profiling for High-Accuracy Micromachining.

This presentation offers a comprehensive and practical overview of laser beam profiling, emphasizing its critical role in high-precision micromachining applications. Laser beam profilers are essential tools that enable engineers and technicians to monitor, control, and optimize laser performance, directly impacting the quality and consistency of micromachined components. The session begins with foundational concepts in beam measurement, including the importance of spatial intensity distribution and temporal stability. It then explores various beam profiling techniques—such as knife-edge, slit scanning, and camera-based methods—highlighting their respective advantages and limitations.

Key parameters like beam diameter, divergence, and M² (beam quality factor) are discussed in detail, as they are vital for assessing beam focusability and energy distribution. Real-world case studies are presented to demonstrate how precise beam characterization leads to improved process reliability, reduced material waste, and enhanced throughput in industrial settings. Whether for research and development or production environments, understanding and applying beam profiling techniques is indispensable for achieving optimal results in micromachining workflows.

Please join us for what is sure to be an interesting and engaging event!

SPIE Photomask Technology + Extreme Ultraviolet Lithography 2025

September 23-24, we will be exhibiting in our beautiful home location of Monterey, CA at the premier worldwide photomask conference. 

This important conference addresses important topics and advancements in photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme ultraviolet lithography, and emerging technologies. Escape the day-to-day and talk with scientists and engineers to share the spontaneous ideas that only happen when we gather in person.

If you'll be attending the show, please stop by Booth 501 and say hello! We'd love to discuss your applications.